Titanium Round Target

A coating target is a sputtering source sputtered onto a substrate to form functional films by magnetron sputtering or other coating systems under appropriate process conditions. That is to say, the target material is the target material of high-speed charge energy particle bombardment, used in high-energy laser weapons, different power densities, different output waveforms, different wavelengths of laser, and different target material interaction, will produce different killing and damaging effects.

The manufacturing of titanium sputtering targets includes preparation of raw material powder, preheating, hot pressing, processing, and surface treatment. Preparation of raw materials is the key to ensuring the quality of titanium sputtering targets. Preheating and hot pressing are important process steps for manufacturing titanium sputtering targets, through which uniform and dense materials are obtained to ensure the physical properties and chemical properties of the targets. The processing includes cutting, forming, and polishing. Surface treatment includes cleaning, passivation, packaging, etc.

Equipped with advanced process, which has longer service. owing to its high performance, titanium round target plays an important role in semiconductor separation devices, flat panel displays, storage electrode films, coating of workpieces, glass coating industry, etc.

Titanium round target has a wide range of uses due to the wide band gap, low dielectric constant, and temperature stability. The thin film is mainly prepared by magnetron sputtering, in which the target material is an important basic raw material in the sputtering coating process. Equipped with excellent and supersonic plasma spraying technology, it has a high heat source temperature and an inert air atmosphere. The spraying distance is small. The particles fly in the plasma jet at a high speed, less likely to be oxidized in the medium, with advantages for spraying easily oxidizable titanium powder.

High melting point: the melting point of titanium is 1668℃, so the titanium target has excellent high-temperature performance.

Good corrosion resistance: titanium has good corrosion resistance, and can resist the corrosion of acid, alkali, and other chemical substances, so it can be used in electroplating, electrolysis, vacuum coating, and other industries.

Good stability: titanium is more stable chemically and can maintain stable performance in high temperature, high pressure, and inert gas environments, so it can be used to prepare some materials under high temperature, high pressure, and inert gas.

Good electrical conductivity: titanium target is a good electrical conductor, so it can be used to prepare electronic components, photovoltaic cells, microelectronic devices, etc. Application: Semiconductor separation, film coating materials, Storage Electrode coating, Sputtering coating, surface coating, spectacles, electronics, optoelectronics, information technology, chemistry, medicine, and aerospace.

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