High Purity Titanium Sputtering Target
Item: High Purity Titanium Sputtering Target
Material: High-purity titanium
Dimension: Dia63 x37mm，Dia100 x40mm
Applications: PVD, Coting, Semiconductor.
Keyword: sputtering target for PVD
Technique: Forging, Grinding.
Purity: above 99.95%
Payment Terms: T/T at sight, L/C.
Standards: ISO 9001:2015, EN10204 3.1, MTC/EN10204 3.2
Product Introduction
Description
The high purity titanium sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser memories, electronic control devices, etc., it can also be used in wear-resistant materials, high temperature, and corrosion resistance, High-end decorative supplies and other industries.
Features
Equipped with advanced magnetron sputtering coating, which uses an electron gun system to emit and focus electrons on the material being plated so that the atoms sputtered follow the principle of momentum conversion and detach from the material with higher kinetic energy. Compared with products on the market, our high-purity sputtering target adopts sputtering technologies for thin film materials. It uses the ions generated by the source to accelerate the concentration in a vacuum to form a high-speed energy ion beam, which bombards the solid surface, and the ions exchange kinetic energy with the solid surface atoms.
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Item Name |
Titanium purity: 99.999% |
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Purity |
99.99%~99.995% |
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Shape |
Round or be tailored as your request |
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Available size |
1. Round diameter: 30-2000mm, thickness: 3.0mm-300mm 2. Plate: Length: 200-500mm Width:100-230mm Thickness: 3-40mm 3. Customized is available |
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TQC standards |
ISO9001:2008, SGS, The third-party report |
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Processor |
Forged and CNC Machined |
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Surface |
Turning surface. |
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Applications |
|
|
Application |
Electroplating, chemical engineering & petrochemical technology, medical industry, semiconductor separation, film coating materials, storage electrode coating, sputtering coating, surface coating, and spectacles coating industry. Aerospace (jet engines, missiles, and spacecraft), military, chemical and petroleum products, desalination and paper industry, automotive, agricultural food, medical (prosthetic limbs, orthopedic implants, and dental instruments and fillers), sporting utensils, jewelry, and cell phones, etc.
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Chemical component
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Item |
N |
C |
H |
Fe |
O |
Mo |
Ni |
Residuals Element |
Max Total |
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Gr1 |
0.03 |
0.08 |
0.015 |
0.2 |
0.18 |
/ |
/ |
0.1 |
0.4 |
|
Gr2 |
0.03 |
0.08 |
0.015 |
0.3 |
0.25 |
/ |
/ |
0.1 |
0.4 |
|
Gr7 |
0.03 |
0.08 |
0.015 |
0.3 |
0.25 |
/ |
/ |
0.1 |
0.4 |
|
Gr12 |
0.03 |
0.08 |
0.015 |
0.3 |
0.25 |
0.2-0.4 |
0.6-0.9 |
0.1 |
0.4 |
Features
Purity: purity is one of the main performance indexes of target material because the purity of target material has a great influence on the performance of the film.
In practice, however, also have different requirements for the purity of target material.
Impurity content: solid impurities in the target material and the porosity of oxygen and moisture are the main sources of deposition film. Different uses of the target have different requirements for impurity content, for example, in semiconductor industrial pure aluminum and aluminum alloy material, the alkali metal content and radioactive element content have special requirements.
The higher the purity of the target, the better the performance of the film. Our high purity titanium sputtering target can meet the purity of 99.995%.
Testing
DT: Destructive testing, physical properties testing, hardness testing, chemical composition testing.
NDT: Nondestructive testing, ultrasonic testing, penetration testing, appearance testing.
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